SLF-4

Transparency Photomask Writer

NanoMaterials Facility

MAKE

Screen USA

MODEL

PlateRite FX870II

LOCATION

G27 LISE

PlateRite FX870II is a laser-based digital writer for writing dry-film transparency photmasks. It can output flexo digital plates, letterpress digital plates and thermal ablative film in any size from 4″x4″ (100mmx100 mm) to 30″x34.2″ (762mmx870 mm). The small 4″x4″ format is perfect for writing low-resolution photomasks to expose 3″ wafers. The minimum recommended feature size is 30um for square/rectangular patterns and 50um for rounded and oblique patterns. Typical writing time for a 4″x4″ photomask is less than 5 minutes, not including the prep time. The whole photomask writing process can be completed in half an hour, giving the users unmatched flexibility for fast-prototyping of micro devices.

Contact staff for training information.

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