OL-4

SUSS MA6 Mask Aligner

Nanofabrication Facility

MAKE

SUSS

MODEL

MA6

LOCATION

Cleanroom G07 LISE

The SUSS MA6 Mask Aligner is the highest resolution contact mask aligner available at the CNS, with sub-micron feature capability in positive tone resists. In addition to the highly accurate topside alignment capability, the MA6 can perform front-to-backside alignment with the use of a second alignment microscope.

 

Major functions, features, and benefits:

*Topside(TSA) and Backside(BSA) alignment
*Achievable exposure resolution 0.6 um, alignment resolution better than 1um
*Maximum substrate size 6″
*Able to perform soft, hard, low vacuum and vacuum contact, as well as proximity exposure
*Restricted to positive-tone photoresists
*Minimum alignment mark separation for binocular vision: 5 cm

Training is offered on-demand, typically after users have been trained on the MJB4 mask aligner.

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