Solvent Based Photoresist Developer Station

Nanofabrication Facility


Reynolds Tech



Cleanroom G07 LISE

SB-3 is a Reynolds Tech general purpose work station for solvent-based photoresist developing, particularly for photodefinable epoxies, located in the Photolithography Bay of the Center for Nanoscale Systems cleanroom. An ergonomic, anti-static, chemical spill mat is located in front of SB-3. The bench features a VWR shaker plate, a VWR stirring plate, gooseneck sinks, DI spray guns, N2 drying guns and solvent disposal drains. The touch screen interface displays warnings, alarms and error codes. Solvents are stocked beneath this bench for general use.

For training on this and all wet stations, sign-up at the Center for Nanoscale Systems training events web site.