Positive/Negative Photoresist Station
Cleanroom G07 LISE
SB-3 is a Reynolds Tech general purpose work station for positive and negative photoresist spin coating located in the Photolithography Bay of the Center for Nanoscale Systems cleanroom. An ergonomic, anti-static, chemical spill mat is located in front of SB-3. The bench features two Headway Research spin coaters/controllers, various spinner chuck sizes for pieces through 6″/150mm wafers, two Torrey Pines hot plates, N2 drying guns and a photoresist/solvent disposal drains. The touch screen interface displays warnings, alarms and error codes. Photoresists are stocked beneath this bench for general use.