Photoresist Developer Station
Cleanroom G07 LISE
AB-3 is a Reynolds Tech general purpose photoresist developer station located in the Photolithography Bay of the Center for Nanoscale Systems cleanroom. All water supplied to this bench is 18 Mohm deionized water. An ergonomic, anti-static, chemical spill mat is located in front of AB-3. The bench features a hot plate with temperature probe, stirring plate, dump rinser, cascade rinse, plenum rinse, a gooseneck sink, DI spray guns, aspirator and N2 drying guns. The touch screen interface allows for user control of dump rinser, cascade rinse and aspirator timers, as well as displaying warnings, alarms and error codes. Photoresist developers are stocked beneath this bench for general use.