AB-3

Photoresist Developer Station

Nanofabrication Facility

MAKE

Reynolds Tech

MODEL

FWS 96CPVC

LOCATION

Cleanroom G07 LISE

AB-3 is a Reynolds Tech general purpose photoresist developer station located in the Photolithography Bay of the Center for Nanoscale Systems cleanroom. All water supplied to this bench is 18 Mohm deionized water. An ergonomic, anti-static, chemical spill mat is located in front of AB-3. The bench features a hot plate with temperature probe, stirring plate, dump rinser, cascade rinse, plenum rinse, a gooseneck sink, DI spray guns, aspirator and N2 drying guns. The touch screen interface allows for user control of dump rinser, cascade rinse and aspirator timers, as well as displaying warnings, alarms and error codes. Photoresist developers are stocked beneath this bench for general use.

For training on this and all wet stations, sign-up at the Center for Nanoscale Systems training events web site.

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