WS-02

Layout BEAMER/LAB software

Nanofabrication Facility

MAKE

GenIsys

MODEL

BEAMER/LAB

LOCATION

B58 LISE

Layout BEAMER /LAB software is designed for high performance patterning generation of e-beam lithography and photolithography. It ensures high performance EBL and photo pattering, through proximity correction, layout processing and fracturing, and other technologies.

http://genisys-gmbh.com/web/

Contact staff for training information.

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