EL-3

JEOL JSM-7000F

Nanofabrication Facility

MAKE

JEOL

MODEL

JSM-7000F

LOCATION

Cleanroom G07 LISE

Imaging Resolution (SEM-mode):
1.2 nm 30kv
1.5 nm 15kv
3.0 nm 1kv

Magnification Range: 10X-500,000X
Deben PCD Beam Blanking System
Beam Current 10pA-200nA
Computer controlled large eucentric specimen stage
Nabity’s Nanometer Pattern Generation System V9.0

Thermal FE SEM

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