Hitachi NB5000 FIB-SEM
Imaging and Analysis
The NB5000 is a dual-beam FIB-SEM with a Ga ion column, a Gas Injection System, a micromanipulator probe, and a high-resolution FEG-SEM. The ion column runs at 40 kV by default, giving it smaller probe sizes and higher milling rates than a conventional 30 kV FIB, but can be tuned down as low as 1 kV. The SEM has both normal and immersion modes available, for high-resolution SE and BSE imaging. There is also an insertable STEM detector for transmission imaging. The NB5000 has a side-entry port for inserting Hitachi-brand TEM holders and performing ion milling directly on a mounted specimen in the holder. Standard and advanced milling, including liftout and thinning of TEM and APT specimens, and serial sectioning for 3D tomography, are all available on this tool. Tungsten and carbon deposition sources are available.