SC-2

Headway Spin Coater

NanoMaterials Facility

MAKE

Headway

MODEL

PWM32

LOCATION

G06 LISE

This spin coater is shared by Soft Lithography Foundry and Nanoparticle Facility. It can be used for coating wafers or other substrates with polydimethylsiloxane (PDMS), photoresist, nanoparticle suspensions, and other CNS-approved materials. Its maximum speed is 10,000rpm

Please note that training is required prior to use of this tool.

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