GEMStar ALD and Pulsed CVD
Cleanroom G07 LISE
The GEMStar ALD and Pulsed CVD system from Arradiance Inc. a mid-temperature (160 – 375 C) deposition system that uses surface self limiting reactions in ALD mode and traditional CVD reactions to grow conducting metal nitride and pure metal films with good uniformity, conformality, and material purity. Deposition rates are slow, in the range of 1-3 Å per minute, but extremely high-aspect-ratio fill (40:1) is easily achievable (see datasheets). The following processes are available now (Ni3N, Ni, WNx) or will be available in the near future (CoN, Co, Ru, RuO2).