ALD-2

GEMStar ALD and Pulsed CVD

Nanofabrication Facility

MAKE

Arradiance

MODEL

GEMStar

LOCATION

Cleanroom G07 LISE

The GEMStar ALD and Pulsed CVD system from Arradiance Inc. a mid-temperature (160 – 375 C) deposition system that uses surface self limiting reactions in ALD mode and traditional CVD reactions to grow conducting metal nitride and pure metal films with good uniformity, conformality, and material purity. Deposition rates are slow, in the range of 1-3 Å per minute, but extremely high-aspect-ratio fill (40:1) is easily achievable (see datasheets). The following processes are available now (Ni3N, Ni, WNx) or will be available in the near future (CoN, Co, Ru, RuO2).

Contact Philippe de Rouffignac for training or additional information.

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