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Elionix ELS-7000

Nanofabrication Facility

MAKE

Elionix

MODEL

ELS-7000

LOCATION

Cleanroom G07 LISE

Ultra high precision 100 keV Electron Beam Lithography System. Minimum line width 7nm; maximum wafer size 8″. Laser interferometer stage with stitching accuracy 30nm.

Logins

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